---
title: CMP Slurry Blending Closed-Loop Control Case Study
description: DFS' new onboard control technology allows for closed-loop control and monitoring of cmp slurry solution in a blend and distribution operation.
image: https://info.cpsgrp.com/hubfs/CPSGrp_Feb2017/_Home/3%20blog%20images/DFS%20(HP%20Gas%20Gary)/dfs-fusion-chemical-blender.gif
---

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# CMP Slurry Blending with Closed-Loop Real-Time Control & Monitoring

![dfs-fusion-chemical-blender](https://info.cpsgrp.com/hs-fs/hubfs/CPSGrp_Feb2017/_Home/3%20blog%20images/DFS%20(HP%20Gas%20Gary)/dfs-fusion-chemical-blender.png?width=412&name=dfs-fusion-chemical-blender.png)

 

**Remove expensive labor-intensive offline metrologies and manual process adjustments! **

**DFS** has a proven practice of process characterization, where it's possible to use various metrology devices, or combinations of these devices, to achieve the best-in-class in-line metrology driven control with the highest level of precision.

This case study demonstrates how DFS' onboard control technology allows for closed-loop control of a customer-specific semiconductor slurry solution in a blend and distribution operation.

This newly patented DFS process and technology delivers:

- Extreme accuracy regardless of incoming variation
- Process characterization and validation
- In-line metrology driven closed-loop control
- Offline metrology independence
- Precision blend control optimizing process control

**To access your copy, please complete this form.**

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