CMP Slurry Blending with Closed-Loop Real-Time Control & Monitoring

Remove expensive labor-intensive offline metrologies and manual process adjustments! 

DFS has a proven practice of process characterization, where it's possible to use various metrology devices, or combinations of these devices, to achieve the best-in-class in-line metrology driven control with the highest level of precision.

This case study demonstrates how DFS' onboard control technology allows for closed-loop control of a customer-specific semiconductor slurry solution in a blend and distribution operation.

This newly patented DFS process and technology delivers:

• Extreme accuracy regardless of incoming variation
• Process characterization and validation
• In-line metrology driven closed-loop control
• Offline metrology independence
• Precision blend control optimizing process control

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